Difference between revisions of "Surface Coating Technologies"

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Besides manufacturing contact materials from the solid phase, i.e. by melt or
+
Besides manufacturing contact materials from the solid phase, i.e. by melt or powder metallurgy, the production starting in the liquid or gaseous phase is generally preferred when thin layers within the μm range are required, which cannot be obtained economically by conventional cladding methods (<xr id="tab:Overview_of_Important_Properties_of_Electroplated_Coatings_and_their_Applications"/><!--(Tab. 7.1)-->). Such coatings fulfill different requirements depending on their composition and thickness.
powder metallurgy, the production starting in the liquid or gaseous phase is
+
They can serve as corrosion or wear protection or can fulfill the need for thin contact layers for certain technical applications. In addition they serve for decorative purposes as a pleasing and wear resistant surface coating.
generally preferred when thin layers in the μm range are required which cannot
 
be obtained economically by conventional cladding methods. Such coatings
 
fulfill different requirements depending on their composition and thickness.
 
They can serve as corrosion or wear protection or can fulfill the need for thin
 
contact layers for certain technical applications. In addition they serve for
 
decorative purposes as a pleasing and wear resistant surface coating.
 
  
Table 7.1: Overview of Important Properties of Electroplated Coatings
+
<figtable id="tab:Overview_of_Important_Properties_of_Electroplated_Coatings_and_their_Applications">
and their Applications
+
<caption>'''<!--Table 7.1:-->Overview of Important Properties of Electroplated Coatings and their Applications'''</caption>
  
To reduce the mechanical wear of thin surface layers on sliding and connector
+
{| class="twocolortable" style="text-align: left; font-size: 12px"
contacts additional lubricants in liquid form are often used. On silver contacts
+
|-
passivation coatings are applied as protection against silver sulfide formation.
+
!Properties
 +
!Applications
 +
!Examples
 +
|-
 +
|Color
 +
|Pleasing appearance
 +
|Brass plated lamps and furniture hardware
 +
|-
 +
|Luster
 +
|Decorative appearance, Light reflection
 +
|Chrome plated fixtures, silver coated mirrors
 +
|-
 +
|Hardness / Wear Resistance
 +
|Prolonging of mechanical wear life
 +
|Hard chrome plated tools
 +
|-
 +
|Sliding properties
 +
|Improvement of dry sliding wear
 +
|Lead-tin-copper alloys for slide bearings
 +
|-
 +
|Chemical stability
 +
|Protection against chemical effects
 +
|Lead-Tin coatings as etch resist on PC boards
 +
|-
 +
|Corrosion resistance
 +
|Protection against environmental corrosion
 +
|Zinc coatings on steel parts
 +
|-
 +
|Electrical conductivity
 +
|Surface conduction of electrical current
 +
|Conductive path on PC boards
 +
|-
 +
|Thermal conductivity
 +
|Improved heat conduction on the surface
 +
|Copper plated bottoms for cookware
 +
|-
 +
|Machining capability
 +
|Shaping through machining
 +
|Copper coatings on low pressure cylinders
 +
|-
 +
|Magnetic properties
 +
|Increase of coercive force [[#text-reference|<sup>*)</sup>]]
 +
|Cobalt-nickel layers on magnetic storage media
 +
|-
 +
|Brazing and soldering
 +
|Brazing without aggressive fluxes
 +
|Tin-Lead coatings on PC board paths
 +
|-
 +
|Adhesion strength
 +
|Improvement of adhesion
 +
|Brass coating on reinforcement steel wires in tires
 +
|-
 +
|Lubricating properties
 +
|Improvement of formability
 +
|Copper plating for wire drawing
 +
|}
 +
</figtable>
 +
<div id="text-reference">*) Coercive force= force to retaim the adopted magnetisation</div>
 +
 
 +
To reduce the mechanical wear of thin surface layers on sliding and connector contacts, additional lubricants in liquid form are often used. On silver contacts, passivation coatings are applied as protection against silver sulfide formation.
  
 
==Coatings from the Liquid Phase==
 
==Coatings from the Liquid Phase==
For thin coatings starting from the liquid phase two processes are used
+
For thin coatings starting from the liquid phase, two processes are used differentiated by the metallic deposition being performed either with or without the use of an external electrical current source. The first one is electroplating, while the second one is a chemical deposition process.
differentiated by the metallic deposition being performed either with or without
 
the use of an external electrical current source. The first one is electroplating
 
while the second one is a chemical deposition process.
 
  
 
=== Electroplating (or Galvanic Deposition)===
 
=== Electroplating (or Galvanic Deposition)===
For electroplating of metals, especially precious metals, water based solutions
+
For electroplating of metals, especially precious metals, water based solutions (electrolytes) are used, which contain the metals to be deposited as ions (i.e. dissolved metal salts). An electric field between the anode and the work pieces as the cathode, forces the positively charged metal ions to move to the cathode where they give up their charge and deposit themselves as metal on the surface of the work piece.
(electrolytes) are used which contain the metals to be deposited as ions (i.e.
+
Depending on the application, for electric and electronic or decorative end use, different electrolytic bath solutions (electrolytes) are used. The electroplating equipment used for precious metal plating and its complexity varies widely, depending on the process technologies employed.
dissolved metal salts). An electric field between the anode and the work pieces
+
Electroplating processes are encompassing, besides the pure metal deposition, also preparative and post treatments of the goods to be coated. An important parameter for creating strongly adhering deposits is that the surface of the goods has to be metallic clean without oily or oxide film residues. This is achieved through various pre-treatment processes, specifically developed for the types of material and surface conditions of the goods to be plated.
as the cathode forces the positively charged metal ions to move to the cathode
+
In the following segments, electrolytes – both precious and non-precious – as well as the most widely used electroplating processes are described.
where they give up their charge and deposit themselves as metal on the surface
 
of the work piece.
 
Depending on the application, for electric and electronic or decorative end use,
 
different electrolytic bath solutions (electrolytes) are used. The electroplating
 
equipment used for precious metal plating and its complexity varies widely
 
depending on the process technologies employed.
 
Electroplating processes are encompassing besides the pure metal deposition
 
also preparative and post treatments of the goods to be coated. An important
 
parameter for creating strongly adhering deposits is the surface of the goods to
 
be metallic clean without oily or oxide film residues. This is achieved through
 
various pre-treatment processes specifically developed for the types of material
 
and surface conditions of the goods to be plated.
 
In the following segments electrolytes – both precious and non-precious – as
 
well as the most widely used electroplating processes are described.
 
 
 
  
 
Main Articel: [[Electroplating (or Galvanic Deposition)| Electroplating (or Galvanic Deposition)]]
 
Main Articel: [[Electroplating (or Galvanic Deposition)| Electroplating (or Galvanic Deposition)]]
  
===7.1.2 Electroless Plating===
+
===<!--7.1.2-->Electroless Plating===
 
 
====7.1.2.1 Introduction====
 
Electroless plating is defined as a coating process which is performed without
 
the use of an external current source. It allows a uniform metal coating
 
independent of the geometrical shape of the parts to be coated. Because of the
 
very good dispersion capability of the used electrolytes also cavities and the
 
inside of drilled holes in parts can be coated for example.
 
In principal two different mechanisms are employed for electroless plating:
 
processes in which the carrier material serves as a reduction agent (Immersion
 
processes) and those in which a reduction agent is added to the electrolyte
 
(Electroless processes).
 
 
 
Main Articel: [[Other Naturally Hard Copper Alloys| Other Naturally Hard Copper Alloys]]
 
 
 
====7.1.2.2 Immersion Processes====
 
The immersion processes are usually applied in the plating of the metals gold,
 
silver, and tin. If the material to be coated is less precious, i.e. exhibits a
 
negative standard potential against the metal ions in the surrounding solution, it
 
goes into solution releasing electrons while the more precious metal ions are
 
reduced by absorbing electrons and being deposited on the electrode. This
 
process can continue until the complete surface of the substrate is covered
 
with a thin layer of the more precious metal. This limits the maximum achievable
 
layer thickness to approx. 0.1 μm ''(Table 7.5)''.
 
 
 
Table 7.5: Immersion Gold Electrolytes
 
<table border="1" cellspacing="0" style="border-collapse:collapse"><tr><td><p class="s8">Type of Electrolyte</p></td><td><p class="s8">pH-Range</p></td><td><p class="s8">Coating Properties</p></td><td><p class="s8">Application Ranges</p></td></tr><tr><td><p class="s8">Type of Electrolyte</p></td><td><p class="s8">pH-Range</p></td><td><p class="s8">Hardness</p><p class="s8">HV 0.025</p></td><td><p class="s8">Punity</p></td><td><p class="s8">Application Ranges</p></td></tr><tr><td><p class="s8">Immersion Gold electrolytes</p></td><td/><td/><td/><td/></tr><tr><td><p class="s8">AUROL 4</p><p class="s8">AUROL 16</p><p class="s8">AUROL 20</p></td><td><p class="s8">3.8 - 4.2</p><p class="s8">5.8 - 6.2</p><p class="s8">5.8 - 6.2</p><p class="s8">5.8 - 6.2</p></td><td><p class="s8">60 - 80</p><p class="s8">60 - 80</p><p class="s8">60 - 80</p><p class="s8">60 - 80</p></td><td><p class="s8">99.99% Au</p><p class="s8">99.99% Au</p><p class="s8">99.99% Au</p><p class="s8">99.99% Au</p></td><td><p class="s8">Thin gold layers on Ni, Ni alloys,</p><p class="s8">Fe and Fe alloys for PCB technology and technical applications</p></td></tr></table>
 
 
 
====7.1.2.3 Electroless Processes====
 
The electroless metal plating with adding reduction agents to the electrolyte is
 
based on the oxidation of the reducing agent with release of electrons which
 
then in turn reduce the metal ions. To achieve a controlled deposition from such
 
solutions the metal deposition has to happen through the catalytic influence of
 
the substrate surface.
 
  
Otherwise a “wild” uncontrollable deposition would occur. In most cases
+
Electroless plating is defined as a coating process which is performed without the use of an external current source. It allows a uniform metal coating, independent of the geometrical shape of the parts, to be coated. Because of the very good dispersion capability of the used electrolytes, also cavities and the inside of drilled holes in parts can be coated for example.
palladium containing solutions are used for the activation which seed the
+
In principal, two different mechanisms are employed for electroless plating: processes in which the carrier material serves as a reduction agent (Immersion processes) and those in which a reduction agent is added to the electrolyte (Electroless processes).
surfaces with palladium and act as catalysts in the copper and nickel
 
electrolytes.
 
  
The electrolytes contain besides the complex ion compounds of the metals to
+
Main Articel: [[Electroless Plating| Electroless Plating]]
be deposited also stabilizers, buffer and accelerator chemicals, and a suitable
 
reduction agent.
 
  
These electrolytes are usually operating at elevated temperatures (50° – 90°C).
+
==<!--7.2-->Coatings from the Gaseous Phase (Vacuum Deposition)==
The deposits contain besides the metals also process related foreign inclusions
+
The term PVD (physical vapor deposition) defines processes of metal, metal alloys and chemical compounds deposition in a vacuum by adding thermal and kinetic energy by particle bombardment. The main processes are the following four coating variations (<xr id="tab:Characteristics of the Most Important PVD Processes"/><!--(Table 7.6-->):
such as for example decomposition products of the reduction agents.
 
The electroless processes are used mainly for copper, nickel, and gold
 
deposits.
 
  
====7.1.2.4 Electroless Deposition of Nickel/Gold====
+
*Vapor deposition   
 +
*Sputtering (Cathode atomization)
 +
*Arc vaporizing     
 +
*Ion implantation
  
Electroless deposited nickel coatings with an additional immersion layer of gold
+
In all four processes, the coating material is transported in its atomic form to the substrate and deposited on it as a thin layer (a few nm to approx. 10 μm)
are seeing increased importance in the coating of printed circuit boards (PCBs).
 
The process sequence is shown in ''(Fig. 7.2)'' using the example of the
 
DODUCHEM process.
 
  
Tabelle
 
  
After the pre-cleaning (degreasing and etching) a palladium sulfate activator is
+
<figtable id="tab:Characteristics of the Most Important PVD Processes">
used which activates the exposed copper surfaces on the printed circuit board
+
<caption>'''<!--Table 7.6:-->Characteristics of the Most Important PVD Processes'''</caption>
and thus facilitates the nickel deposition. The electroless working chemical
 
nickel electrolyte contains – besides other ingredients – Sodium-hypophosphite,
 
which is reduced to phosphorus in a parallel occurring process and
 
incorporated into the nickel deposit. At the temperature of 87 – 89°C a very
 
homogeneous nickel-phosphorus alloy layer with approx. 9 wt% P is deposited
 
with layer thicknesses > 5 μm possible. During a consecutive processing step
 
a very thin and uniform layer (< 0.1 μm) of gold is added in an immersion
 
electrolyte. This protects the electroless nickel layer against corrosion achieving
 
a solderable and well bondable surface for thick or fine aluminum bond wires.
 
  
It is possible to enhance this layer combination further by adding a immersion
+
{| class="twocolortable" style="text-align: left; font-size: 12px"
palladium layer between the electroless nickel and the gold coating
+
|-
(DODUBOND process). This Pd layer acts as a diffusion barrier and allows the
+
!Process
usage of this surface combination also for gold wire bonding.
+
!Principle
 +
!Process Gas Pressure
 +
!Particle Energy
 +
!Remarks
 +
|-
 +
|Vapor deposition
 +
|Vaporizing in a crucible <br />(electron beam or resistance heating)
 +
|10<sup>-3</sup> Pa
 +
|< 2eV
 +
|Separation of alloy components may occur
 +
|-
 +
|Arc vaporizing
 +
|Vaporizing of the target <br />plate in an electrical arc
 +
|10<sup>-1</sup> Pa-1Pa
 +
|80eV-300eV
 +
|Very good adhesion due to ion bombardement
 +
|-
 +
|Sputtering
 +
|Atomizing of the target plate<br />(cathode) in a gas discharge
 +
|10<sup>-1</sup> Pa-1Pa
 +
|10eV-100eV
 +
|Sputtering of non-conductive materials possible through RF operation
 +
|-
 +
|Ion implantation
 +
|Combination of vapor <br />deposition and sputtering
 +
|10<sup>-1</sup> Pa-1Pa
 +
|80eV-300eV
 +
|Very good adhesion from ion bombardment but also heating of the substrate material
 +
|}
 +
</figtable>
  
As an alternative, for gold wire bonding applications a thicker gold layer of 0.2 –
 
0.5 μm can be applied using an electroless process. Typical electrolytes work at
 
a temperature of approx. 80°C with deposition rates of 0.3 – 0.4 μm per 30
 
minutes. There are however limitations with these electroless electrolytes
 
concerning their stability and the robustness of the process compared to other
 
electroplating processes which reduces their wider usage ''(Fig. 7.3)''.
 
  
Fig. 7.3:
+
The sputtering process has gained the economically most significant usage. Its process principle is illustrated in (<xr id="fig:Principle of sputtering"/><!--(Fig. 7.5)-->).
Coating composition
 
of a printed circuit board with
 
reductively enhanced gold
 
  
====7.1.2.5 Immersion Deposition of Tin====
+
<figure id="fig:Principle of sputtering">
A tin coating by ion exchange is usually not possible since copper is the more
+
[[File:Principle of sputtering.jpg|right|thumb|Figure 1: Principle of sputtering Ar = Argon atoms; e = Electrons; M = Metal atoms]]
precious metal. By adding thio-urea the electro-chemical potential of copper is
+
</figure>
reduced to a level (approx. 450 mV, significantly lower than tin) that allows the
+
Initially, a gas discharge is ignited in a low pressure (10<sup>-1</sup> -1 Pa) argon atmosphere. The argon ions generated, are accelerated in an electric field and impact the target of material to be deposited with high energy. Caused by this energy, atoms are released from the target material which condensate on the oppositely arranged anode (the substrate) and form a layer with high adhesion strength. Through an overlapping magnetic field at the target location, the deposition rate can be increased, making the process more economical.
exchange reaction. Using a suitable electrolyte composition and enhancer
 
solutions like with the DODUSTAN process ''(Fig. 7.4)'' tin coatings can be
 
produced that, even under usually unfavorable conditions of copper
 
concentrations of 7 g/l in the electrolyte, are well solderable.
 
  
Fig. 7.4: Process flow for electroless tin deposition using the DODUSTAN process
+
The advantages of the PVD processes and especially sputtering for electrical contact applications are:
  
The immersion tin deposition is suitable for the production of a well solderable
+
*High purity of the deposit layers 
surface on printed circuit boards and electronic components. It is also used as
+
*Low thermal impact on the substrate
an etch resist against ammonia based solutions or as corrosion and oxidation
+
*Almost unlimited coating materials 
protection of copper surfaces.
+
*Low coating thickness tolerance   
 +
*Excellent adhesion (also by using additional intermediate layers)
  
==7.2 Coatings from the Gaseous Phase (Vacuum Deposition)==
+
Coatings produced by PVD processes are used for contact applications, for example on miniature-profiles, in electrical engineering and for electronic components, for solderability in joining processes, for metalizing of nonconductive materials, as well as in semiconductors, opto-electronics, optics and medical technology applications.
The term PVD (physical vapor deposition) defines processes of metal, metal
 
alloys, and chemical compounds deposition in a vacuum by adding thermal and
 
kinetic energy through particle bombardment. The main processes are the
 
following four coating variations ''(Table 7.6)'':
 
  
*Vapor deposition    *Sputtering (Cathode atomization)
+
There are few limitations regarding the geometrical shape of substrate parts. Only the interior coating of drilled holes and small diameter tubing can be more problematic (ratio of depth to diameter should be < 2:1). Profile wires, strips and foils can be coated from one side or both; formed parts can be coated selectively by using masking fixtures that at the same time serve as holding fixtures  (<xr id="fig:Examples of vacuum coated semi finished materials and parts"/>).
*Arc vaporizing      *Ion implantation
 
  
In all four processes the coating material is transported in its atomic form to the
+
<figure id="fig:Examples of vacuum coated semi finished materials and parts">
substrate and deposited on it as a thin layer (a few nm to approx. 10 μm)
+
[[File:Examples of vacuum coated semi finished materials and parts.jpg|left|Figure 2: Examples of vacuum coated semi finished materials and parts]]
 
+
</figure>
Table 7.6: Characteristics of the Most Important PVD Processes
 
 
 
tabelle fehlt!
 
 
 
The sputtering process has gained the economically most significant usage. Its
 
process principle is illustrated in ''(Fig. 7.5)''.
 
 
 
Fig. 7.5: Principle of sputtering Ar = Argon atoms; e = Electrons; M = Metal atoms
 
 
 
Initially a gas discharge is ignited in a low pressure (10 – 1 Pa) argon
 
atmosphere. The argon ions generated are accelerated in an electric field and
 
impact the target of material to be deposited with high energy. Caused by this
 
energy atoms are released from the target material which condensate on the
 
oppositely arranged anode (the substrate) and form a layer with high adhesion
 
strength. Through an overlapping magnetic field at the target location the
 
deposition rate can be increased, making the process more economical.
 
 
 
The advantages of the PVD processes and especially sputtering for electrical
 
contact applications are:
 
 
 
*High purity of the deposit layers  *Low thermal impact on the
 
*Almost unlimited coating materials   substrate
 
*Low coating thickness tolerance    *Excellent adhesion (also by using additional intermediate layers)
 
 
 
Coatings produced by PVD processes are used for contact applications, for
 
example on miniature-profiles, in electrical engineering and for electronic
 
components, for solderability in joining processes, for metalizing of nonconductive
 
materials, as well as in semiconductors, opto-electronics, optics,
 
and medical technology applications.
 
 
 
There are few limitations regarding the geometrical shape of substrate parts.
 
Only the interior coating of drilled holes and small diameter tubing can be more
 
problematic (ratio of depth to diameter should be < 2:1). Profile wires, strips,
 
and foils can be coated from one side or both; formed parts can be coated
 
selectively by using masking fixtures that at the same time serve as holding
 
fixtures.
 
 
 
*'''Examples of vacuum coated semi-finished materials and parts'''
 
bild
 
  
 +
<br style="clear:both;"/>
 
*'''Materials'''
 
*'''Materials'''
 
Selection of possible combinations of coating and substrate materials
 
Selection of possible combinations of coating and substrate materials
  
<table border="1" cellspacing="0" style="border-collapse:collapse"><tr><td><p class="s8">Substrate Materials</p></td><td><p class="s8">Coating Materials</p></td></tr><tr><td><p class="s8">Substrate Materials</p></td><td><p><span>Ag</span></p></td><td><p><span>Au</span></p></td><td><p><span>Pt</span></p></td><td><p><span>Pd</span></p></td><td><p><span>Cu</span></p></td><td><p><span>Ni</span></p></td><td><p><span>Ti</span></p></td><td><p><span>Cr</span></p></td><td><p><span>Mo</span></p></td><td><p><span>W</span></p></td><td><p><span>Ai</span></p></td><td><p><span>Si</span></p></td></tr><tr><td><p class="s8">Precious metal / alloys</p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">NF metals / alloys</p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">Fe alloys / stainless steel</p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">Special metals (Ti, Mo, W)</p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">Carbide steels (WC-Co)</p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">Ceramics (Al<span class="s16">2</span>O<span class="s16">3</span>, AlN)</p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">Glasses (SiO<span class="s16">2</span>, CaF)</p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">Plastics (PA, PPS)</p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr></table>
+
<table class="twocolortable">
 +
<tr><th rowspan="2"><p class="s8">Substrate Materials</p></th><th colspan="12"><p class="s8">Coating Materials</p></th></tr>
 +
<tr><th><p><span>Ag</span></p></th><th><p><span>Au</span></p></th><th><p><span>Pt</span></p></th><th><p><span>Pd</span></p></th><th><p><span>Cu</span></p></th><th><p><span>Ni</span></p></th><th><p><span>Ti</span></p></th><th><p><span>Cr</span></p></th><th><p><span>Mo</span></p></th><th><p><span>W</span></p></th><th><p><span>Ai</span></p></th><th><p><span>Si</span></p></th></tr>
 +
<tr><td><p class="s8">Precious metal / alloys</p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">NF metals / alloys</p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">Fe alloys / stainless steel</p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">Special metals (Ti, Mo, W)</p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">Carbide steels (WC-Co)</p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">Ceramics (Al<span class="s16">2</span>O<span class="s16">3</span>, AlN)</p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">Glasses (SiO<span class="s16">2</span>, CaF)</p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">Plastics (PA, PPS)</p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr></table>
 +
 
 +
[[File:K7-gef.png]] can be produced
 +
[[File:K7-leer.png]] can be produced with intermediate layer
  
 
*'''Dimensions'''
 
*'''Dimensions'''
  
Dimensions
+
{| class="twocolortable" style="text-align: left; font-size: 12px;width:40%"
Coating thickness: 10 nm - 15 μm
+
|-
Coating thicknesses for contact applications: 0.1 - 10 μm
+
!colspan="2" style="text-align:center"|'''Dimensions'''
 +
|-
 +
|Coating thickness:
 +
|10 nm - 15 μm
 +
|-
 +
|Coating thicknesses for contact applications:
 +
|0.1 - 10 μm
 +
|}
  
For the geometry of semi-finished products to be coated there are few
+
For the geometry of semi-finished products to be coated, there are few restrictions. Only the coating of the inside of machined holes and tubing has
restrictions. Only the coating of the inside of machined holes and tubing has
 
 
limitations.
 
limitations.
  
 
*'''Tolerances'''
 
*'''Tolerances'''
  
Coating thickness +10 - 30 %, depending on the thickness
+
Coating thickness &#177;10 - 30 %, depending on the thickness
  
 
*'''Quality criteria'''
 
*'''Quality criteria'''
Depending on the application the following parameters are tested and recorded
+
Depending on the application, the following parameters are tested and recorded (see also: Electroplating of parts):
(see also: Electroplating of parts):
 
  
*Coating thickness  *Solderability  
+
*Coating thickness   
*Adhesion strength  *Bonding property
+
*Solderability  
*Porosity          *Contact resistance  
+
*Adhesion strength   
 +
*Bonding property
 +
*Porosity           
 +
*Contact resistance  
  
These quality tests are performed according to industry standards, internal
+
These quality tests are performed according to industry standards, internal standards and customer specifications resp.
standards, and customer specifications resp.
 
  
==7.3 Comparison of Deposition Processes==
+
==<!--7.3-->Comparison of Deposition Processes==
The individual deposition processes have in part different performance
+
The individual deposition processes have in part different performance characteristics. For each end application, the optimal process has to be chosen, considering all technical and economical factors. The main selection criteria should be based on the electrical and mechanical requirements for the contact layer and on the design characteristics of the contact component. <xr id="tab:Comparison of different coating processes"/><!--Table 7.7--> gives some indications for a comparative evaluation of the different coating processes.
characteristics. For each end application the optimal process has to be chosen
 
considering all technical and economical factors. The main selection criteria
 
should be based on the electrical and mechanical requirements for the contact
 
layer and on the design characteristics of the contact component. Table 7.7
 
gives some indications for a comparative evaluation of the different coating
 
processes.
 
  
The electroless metal coating is not covered here because of the low thickness
+
The electroless metal coating is not covered here because of the low thickness of deposits, which makes them in most cases not suitable for contact
of deposits which makes them in most cases not suitable for contact
 
 
applications.
 
applications.
  
Table 7.7: Comparison of different coating processes
 
  
The main differences between the coating processes are found in the coating
+
<figtable id="tab:Comparison of different coating processes">
materials and thickness. While mechanical cladding and sputtering allow the
+
<caption>'''<!--Table 7.7:-->Comparison of different coating processes'''</caption>
use of almost any alloy material, electroplating processes are limited to metals
 
and selected alloys such as for example high-carat gold alloys with up to .3
 
wt% Co or Ni. Electroplated and sputtered surface layers have a technological
 
and economical upper thickness limit of about 10μm. While mechanical cladding
 
has a minimum thickness of approx. 1 μm, electroplating and sputtering
 
can also be easily applied in very thin layers down to the range of 0.1 μm.
 
  
The properties of the coatings are closely related to the coating process.
+
{| class="twocolortable" style="text-align: left; font-size: 12px"
Starting materials for cladding and sputtering targets precious metals and their
+
|-
alloys which in the case of gold and palladium based materials are vacuum
+
!Process / Coating Properties
melted and therefore exhibit a very high purity. During electroplating, depending
+
!Mechanical Processes (Cladding)
on the type of electrolytes and the deposition parameters, some electrolyte
+
!Electroplating
components such as carbon and organic compounds are incorporated into
+
!Vaccum Deposition (Sputtering)
the precious metal coating. Layers deposited from the gaseous phase however
+
|-
are very pure.
+
|Coating material
 +
|formabe metal and alloys
 +
|metals, alloys only limited
 +
|metals and alloys
 +
|-
 +
|Coating thickness
 +
|> 1μm
 +
|0.1 - approx. 10 μm <br />(in special cases up to 100 μm)
 +
|0.1 approx. 10 μm
 +
|-
 +
|Coating configuration
 +
|selectively, stamping edges not coated
 +
|all around and selectively<br />stamping edges coated
 +
|mostly selectivity
 +
|-
 +
|Adhesion
 +
|good
 +
|good
 +
|very good
 +
|-
 +
|Ductility
 +
|good
 +
|limited
 +
|good
 +
|-
 +
|Purity
 +
|good
 +
|inclusions of foreign materials
 +
|very good
 +
|-
 +
|Porosity
 +
|good
 +
|good for > approx. 1μm
 +
|good
 +
|-
 +
|Temperature stability
 +
|goodvery good
 +
|good
 +
|very good
 +
|-
 +
|Mechanical wear
 +
|little
 +
|very little
 +
|little
 +
|-
 +
|Environmental impact
 +
|little
 +
|significant
 +
|none
 +
|}
 +
</figtable>
  
==7.4 Hot (-Dipped) Tin Coated Strip Materials==
+
The main differences between the coating processes are found in the coating materials and thickness. While mechanical cladding and sputtering allow the use of almost any alloy material, electroplating processes are limited to metals and selected alloys, such as for example high-carat gold alloys with up to .3 wt% Co or Ni. Electroplated and sputtered surface layers have a technological and economical upper thickness limit of about 10μm. While mechanical cladding has a minimum thickness of approx. 1 μm, electroplating and sputtering can also be easily applied in very thin layers down to the range of 0.1 μm.
During hot-dip tinning pre-treated strip materials are coated with pure tin or tin
 
alloys from a liquid solder metal. During overall (or all-around) tinning the
 
stripsthrough a liquid metal melt. For strip tinning rotating rolls are partially
 
immersed into a liquid tin melt and transport the liquid onto the strip which is
 
guided above them. Through special wiping and gas blowing procedures the
 
deposited tin layer can be held within tight tolerances. Hot tinning is performed
 
directly onto the base substrate material without any pre-coating with either
 
copper or nickel. Special cast-on processes or the melting of solder foils onto
 
the carrier strip allow also the production of thicker solder layers
 
(> 15 μm).
 
  
The main advantage of hot tinning of copper and copper alloys as compared to
+
The properties of the coatings are closely related to the coating process. Starting materials for cladding and sputtering targets precious metals and their alloys, which in the case of gold and palladium based materials, are vacuum melted and therefore exhibit a very high purity. During electroplating, depending on the type of electrolytes and the deposition parameters, some electrolyte components such as carbon and organic compounds are incorporated into the precious metal coating. Layers deposited from the gaseous phase however are very pure.
tin electroplating is the formation of an inter-metallic copper-tin phase (Cu<sub>3</sub>Sn,
 
Cu<sub>6</sub> Sn<sub>5</sub>) at the boundary between the carrier material and the tin layer. This thin
 
(0.3 – 0.5 μm) intermediate layer, which is formed during the thermal tinning
 
process, is rather hard and reduces in connectors the frictional force and
 
mechanical wear. Tin coatings produced by hot tinning have a good adhesion to
 
the substrate material and do not tend to tin whisker formation.
 
  
A special process of hot tinning is the “Reflow” process. After depositing a tin
+
==<!--7.4-->Hot (-Dipped) Tin Coated Strip Materials==
coating by electroplating the layer is short-time melted in a continuous process.
+
During hot-dip tinning, pre-treated strip materials are coated with pure tin or tin alloys from a liquid solder metal. During overall (or all-around) tinning the strips through a liquid metal melt. For strip tinning, rotating rolls are partially immersed into a liquid tin melt and transport the liquid onto the strip, which is guided above them. Through special wiping and gas blowing procedures, the deposited tin layer can be held within tight tolerances. Hot tinning is performed directly onto the base substrate material without any pre-coating with either copper or nickel. Special cast-on processes or the melting of solder foils onto the carrier strip, also allows the production of thicker solder layers ( > 15 μm).
The properties of these reflow tin coatings are comparable to those created by
 
conventional hot tinning.
 
  
Besides overall tin coating of strip material the hot tinning can also be applied in
+
The main advantage of hot tinning of copper and copper alloys, compared to tin electroplating, is the formation of an inter-metallic copper-tin phase (Cu<sub>3</sub>Sn, Cu<sub>6</sub>Sn<sub>5</sub>) at the boundary between the carrier material and the tin layer. This thin (0.3 – 0.5 μm) intermediate layer, which is formed during the thermal tinning process, is rather hard and reduces the frictional force and mechanical wear in connectors. Tin coatings produced by hot tinning have a good adhesion to the substrate material and do not tend to tin whisker formation.
the form of single or multiple stripes on both sides of a continuous substrate
 
strip.
 
  
*'''Typical examples of hot tinned strip materials'''
+
A special process of hot tinning is the “Reflow” process. After depositing a tin coating by electroplating, the layer is short-time melted in a continuous process.
bild
+
The properties of these reflow tin coatings are comparable to those created by conventional hot tinning.
  
 +
Besides overall tin coating of strip material, the hot tinning can also be applied in the form of single or multiple stripes on both sides of a continuous substrate strip (<xr id="fig:Typical examples of hot tinned strip materials"/>).
 +
 +
<figure id="fig:Typical examples of hot tinned strip materials">
 +
[[File:Typical examples of hot tinned strip materials.jpg|left|Figure 3: Typical examples of hot tinned strip materials]]
 +
<br style="clear:both;"/>
 +
</figure>
 +
<br style="clear:both;"/>
 
*'''Materials'''
 
*'''Materials'''
Coating materials: Pure tin, tin alloys
+
Coating materials: Pure tin, tin alloys<br>
Substrate materials: Cu, CuZn, CuNiZn, CuSn, CuBe and others
+
Substrate materials: Cu, CuZn, CuNiZn, CuSn, CuBe and others<br />
  
 
*'''Dimensions and Tolerances'''
 
*'''Dimensions and Tolerances'''
Width of tinning: > 3 + 1 mm
+
{| class="twocolortable" style="text-align: left; font-size: 12px;width:40%"
Thickness of tinning: 1 - 15 μm
+
|-
Tolerances (thickness): + 1 - +3 μm depending on tin thickness
+
|Width of tinning:    
 +
|&#8805; 3 &#177; 1 mm
 +
|-
 +
|Thickness of tinning:  
 +
|1 - 15 μm
 +
|-
 +
|Tolerances (thickness):  
 +
|&#177; 1 - &#177; 3 μm depending on tin thickness
 +
|}
  
 
*'''Quality Criteria'''
 
*'''Quality Criteria'''
Mechanical strength and dimensional tolerances of hot tinned strips are closely
+
Mechanical strength and dimensional tolerances of hot tinned strips are closely related to the standard for Cu and Cu alloy strips according to DIN EN 1652 and DIN EN 1654.
related to the standard for Cu and Cu alloy strips according to DIN EN 1652 and
 
DIN EN 1654.
 
 
Quality criteria for the actual tin coatings are usually agreed upon separately.
 
Quality criteria for the actual tin coatings are usually agreed upon separately.
  
==7.5 Contact Lubricants==
+
==<!--7.5-->Contact Lubricants==
By using suitable lubricants the mechanical wear and frictional oxidation of
+
By using suitable lubricants, the mechanical wear and frictional oxidation of sliding and connector contacts can be substantially reduced. In the electrical contact technology, solid as well as high and low viscosity liquid lubricants are used.
sliding and connector contacts can be substantially reduced. In the electrical
 
contact technology solid, as well as high and low viscosity liquid lubricants are
 
used.
 
  
 
Contact lubricants have to fulfill a multitude of technical requirements:
 
Contact lubricants have to fulfill a multitude of technical requirements:
Line 324: Line 322:
 
*The lubricant layer should not increase the contact resistance; the wear reducing properties of the lubricant film should keep the contact resistance low and consistent over the longest possible operation time
 
*The lubricant layer should not increase the contact resistance; the wear reducing properties of the lubricant film should keep the contact resistance low and consistent over the longest possible operation time
  
Solid lubricants include for example 0.05 – 0.2 μm thin hard gold layers which
+
Solid lubricants include for example 0.05 – 0.2 μm thin hard gold layers, which are added as surface layers on top of the actual contact material.
are added as surface layers on top of the actual contact material.
 
 
 
Among the various contact lubricants offered on the market contact lubrication
 
oils have shown performance advantages. They are mostly synthetic, chemically inert, and silicone-free oils such as for example the DODUCONTA
 
contact lubricants which differ in their chemical composition and viscosity.
 
 
 
For sliding contact systems with contact forces < 50 cN and higher sliding
 
speeds oils with a lower viscosity (<50 mPa·s) are preferential. For applications
 
with higher contact forces and operating at higher temperatures contact oils
 
with a higher viscosity are advantageous. Contact oils are mainly suited for
 
applications at low current loads. At higher loads and in situations where
 
contact separation occurs during the sliding operation thermal decomposition
 
may be initiated which causes the lubricating properties to be lost.
 
 
 
Most compatible with plastics are the contact oil varieties B5, B12K, and B25,
 
which also over longer operating times do not lead to tension stress corrosion.
 
 
 
For the optimum lubrication only a very thin layer of contact oil is required.
 
Therefore it is for example recommended to dilute the oil in iso-propylenealcohol
 
during the application to contact parts. After evaporation of the alcohol
 
a thin and uniform layer of lubricant is retained on the contact surfaces.
 
 
 
 
 
*'''Properties of the Synthetic DODUCONTA Contact Lubricants'''
 
  
<table border="1" cellspacing="0" style="border-collapse:collapse"><tr><td><p class="s8">Lubricant</p></td><td><p class="s8">DODUCONTA</p></td></tr><tr><td><p class="s8">Lubricant</p></td><td><p class="s8">B5</p></td><td><p class="s8">B9</p></td><td><p class="s8">B10</p></td><td><p class="s8">B12K</p></td><td><p class="s8">B25</p></td></tr><tr><td><p class="s8">Contact force</p></td><td><p class="s8">&gt;1N</p></td><td><p class="s8">0.1 - 2N</p></td><td><p class="s8">&lt; 0.2N</p></td><td><p class="s8">0.2 - 5N</p></td><td><p class="s8">&lt;1N</p></td></tr><tr><td><p class="s8">Density (20°C)</p><p class="s8">[g/cm³]</p></td><td><p class="s8">1.9</p></td><td><p class="s8">1.0</p></td><td><p class="s8">0.92</p></td><td><p class="s8">1.0</p></td><td><p class="s8">1.0</p></td></tr><tr><td><p class="s8">Specificel. Resis-</p><p class="s8">tance [<span class="s9">S · </span>cm]</p></td><td/><td><p class="s8">2 x 10<span class="s18">10</span></p></td><td><p class="s8">10<span class="s18">10</span></p></td><td><p class="s8">6 x 10<span class="s18">9</span></p></td><td><p class="s8">5 x 10<span class="s18">8</span></p></td></tr><tr><td><p class="s8">Viscosity (20°C)</p><p class="s8">[mPa·s]</p></td><td><p class="s8">325</p></td><td><p class="s8">47</p></td><td><p class="s8">21</p></td><td><p class="s8">235</p></td><td><p class="s8">405</p></td></tr><tr><td><p class="s8">Congeal temp.[°C]</p></td><td/><td><p class="s8">-55</p></td><td><p class="s8">-60</p></td><td><p class="s8">-40</p></td><td><p class="s8">-35</p></td></tr><tr><td><p class="s8">Flash point[°C]</p></td><td/><td><p class="s8">247</p></td><td><p class="s8">220</p></td><td><p class="s8">238</p></td><td><p class="s8">230</p></td></tr><tr><td/><td><p class="s8">220</p></td><td/><td/></tr></table>
+
Among the various contact lubricants offered on the market, contact lubrication oils have shown performance advantages. They are mostly synthetic, chemically inert and silicone-free oils which differ in their chemical composition and viscosity.
  
 +
For sliding contact systems with contact forces < 50 cN and higher sliding speeds, oils with a lower viscosity (< 50 mPa·s) are preferential. For applications with higher contact forces and operating at higher temperatures, contact oils with a higher viscosity are advantageous. Contact oils are mainly suited for applications at low current loads. At higher loads and in situations where contact separation occurs during the sliding operation, thermal decomposition may be initiated, which causes the lubricating properties to be lost.
  
*'''Applications of the Synthetic DODUCONTA Contact Lubricants'''
 
  
<table border="1" cellspacing="0" style="border-collapse:collapse"><tr><td><p class="s8">Lubricant</p></td><td><p class="s8">Applications</p></td></tr><tr><td><p class="s8">DODUCONTA B5</p></td><td><p class="s8">Current collectors, connectors, slider switches</p></td></tr><tr><td><p class="s8">DODUCONTA B9</p></td><td><p class="s8">Wire potentiometers, slip rings, slider switches, measuring range selectors, miniature connectors</p></td></tr><tr><td><p class="s8">DODUCONTA B10</p></td><td><p class="s8">Precision wire potentiometers, miniature slip rings</p></td></tr><tr><td><p class="s8">DODUCONTA B12K</p></td><td><p class="s8">Wire potentiometers, slider switches, miniature slip rings, connectors</p></td></tr><tr><td><p class="s8">DODUCONTA B25</p></td><td><p class="s8">Current collectors, measuring range selectors, connectors</p></td></tr></table>
+
==<!--7.6-->Passivation of Silver Surfaces==
 
+
The formation of silver sulfide during the shelf life of components with silver surface in sulfur containing environments, can be significantly eliminated by coating them with an additional protective film layer (Passivation layer). For electrical contact use, such thin layers should be chemically inert and sufficiently conductive, otherwise they are easily broken by the applied contact force.
==7.6 Passivation of Silver Surfaces==
+
<figure id="fig:Typical process flow for the SILVERBRITE W ATPS process">
The formation of silver sulfide during the shelf life of components with silver
+
[[File:Typical process flow for the SILVERBRITE W ATPS process.jpg|right|thumb|Figure 4: Typical process flow for the SILVERBRITE W ATPS process]]
surface in sulfur containing environments can be significantly eliminated by
+
</figure>
coating them with an additional protective film layer (Passivation layer). For
+
The passivation process SILVERBRITE W ATPS is a water-based tarnish preventer for silver (<xr id="fig:Typical process flow for the SILVERBRITE W ATPS process"/>). It is free of chromium(VI) compounds and solvents. The passivating layer is applied by immersion, which creates a transparent organic protective film which barely changes the appearance and only slightly
electrical contact use such thin layers should be chemically inert and
+
increases the good electrical properties such as for example the contact resistance. The good solderability and bond properties of silver are not
sufficiently conductive, or be easily broken by the applied contact force.
+
negatively affected. Because of its chemical composition, this protective layer has some lubricating properties which reduce the insertion and withdrawal forces of connectors noticeably.
 
 
The passivation process SILVERBRITE W ATPS is a water-based tarnish
 
preventer for silver. It is free of chromium(VI) compounds and solvents. The
 
passivating layer is applied by immersion which creates a transparent organic
 
protective film which barely changes the appearance and only slightly
 
increases the good electrical properties such as for example the contact
 
resistance. The good solderability and bond properties of silver are not
 
negatively affected. Because of its chemical composition this protective layer
 
has some lubricating properties which reduce the insertion and withdrawal
 
forces of connectors noticeably.
 
 
 
Fig. 7.7: Typical process flow for the SILVERBRITE W ATPS process
 
  
 
==References==
 
==References==
Line 475: Line 437:
 
das Korrosions- und Kontaktverhalten von Ag – Beschichtungen in
 
das Korrosions- und Kontaktverhalten von Ag – Beschichtungen in
 
schwefelhaltiger Umgebung. VDE – Fachbericht 65 (2009) 51 – 58
 
schwefelhaltiger Umgebung. VDE – Fachbericht 65 (2009) 51 – 58
 +
 +
[[de:Beschichtungsverfahren]]

Latest revision as of 15:37, 26 January 2023

Besides manufacturing contact materials from the solid phase, i.e. by melt or powder metallurgy, the production starting in the liquid or gaseous phase is generally preferred when thin layers within the μm range are required, which cannot be obtained economically by conventional cladding methods (Table 1). Such coatings fulfill different requirements depending on their composition and thickness. They can serve as corrosion or wear protection or can fulfill the need for thin contact layers for certain technical applications. In addition they serve for decorative purposes as a pleasing and wear resistant surface coating.

Table 1: Overview of Important Properties of Electroplated Coatings and their Applications
Properties Applications Examples
Color Pleasing appearance Brass plated lamps and furniture hardware
Luster Decorative appearance, Light reflection Chrome plated fixtures, silver coated mirrors
Hardness / Wear Resistance Prolonging of mechanical wear life Hard chrome plated tools
Sliding properties Improvement of dry sliding wear Lead-tin-copper alloys for slide bearings
Chemical stability Protection against chemical effects Lead-Tin coatings as etch resist on PC boards
Corrosion resistance Protection against environmental corrosion Zinc coatings on steel parts
Electrical conductivity Surface conduction of electrical current Conductive path on PC boards
Thermal conductivity Improved heat conduction on the surface Copper plated bottoms for cookware
Machining capability Shaping through machining Copper coatings on low pressure cylinders
Magnetic properties Increase of coercive force *) Cobalt-nickel layers on magnetic storage media
Brazing and soldering Brazing without aggressive fluxes Tin-Lead coatings on PC board paths
Adhesion strength Improvement of adhesion Brass coating on reinforcement steel wires in tires
Lubricating properties Improvement of formability Copper plating for wire drawing
*) Coercive force= force to retaim the adopted magnetisation

To reduce the mechanical wear of thin surface layers on sliding and connector contacts, additional lubricants in liquid form are often used. On silver contacts, passivation coatings are applied as protection against silver sulfide formation.

Coatings from the Liquid Phase

For thin coatings starting from the liquid phase, two processes are used differentiated by the metallic deposition being performed either with or without the use of an external electrical current source. The first one is electroplating, while the second one is a chemical deposition process.

Electroplating (or Galvanic Deposition)

For electroplating of metals, especially precious metals, water based solutions (electrolytes) are used, which contain the metals to be deposited as ions (i.e. dissolved metal salts). An electric field between the anode and the work pieces as the cathode, forces the positively charged metal ions to move to the cathode where they give up their charge and deposit themselves as metal on the surface of the work piece. Depending on the application, for electric and electronic or decorative end use, different electrolytic bath solutions (electrolytes) are used. The electroplating equipment used for precious metal plating and its complexity varies widely, depending on the process technologies employed. Electroplating processes are encompassing, besides the pure metal deposition, also preparative and post treatments of the goods to be coated. An important parameter for creating strongly adhering deposits is that the surface of the goods has to be metallic clean without oily or oxide film residues. This is achieved through various pre-treatment processes, specifically developed for the types of material and surface conditions of the goods to be plated. In the following segments, electrolytes – both precious and non-precious – as well as the most widely used electroplating processes are described.

Main Articel: Electroplating (or Galvanic Deposition)

Electroless Plating

Electroless plating is defined as a coating process which is performed without the use of an external current source. It allows a uniform metal coating, independent of the geometrical shape of the parts, to be coated. Because of the very good dispersion capability of the used electrolytes, also cavities and the inside of drilled holes in parts can be coated for example. In principal, two different mechanisms are employed for electroless plating: processes in which the carrier material serves as a reduction agent (Immersion processes) and those in which a reduction agent is added to the electrolyte (Electroless processes).

Main Articel: Electroless Plating

Coatings from the Gaseous Phase (Vacuum Deposition)

The term PVD (physical vapor deposition) defines processes of metal, metal alloys and chemical compounds deposition in a vacuum by adding thermal and kinetic energy by particle bombardment. The main processes are the following four coating variations (Table 2):

  • Vapor deposition
  • Sputtering (Cathode atomization)
  • Arc vaporizing
  • Ion implantation

In all four processes, the coating material is transported in its atomic form to the substrate and deposited on it as a thin layer (a few nm to approx. 10 μm)


Table 2: Characteristics of the Most Important PVD Processes
Process Principle Process Gas Pressure Particle Energy Remarks
Vapor deposition Vaporizing in a crucible
(electron beam or resistance heating)
10-3 Pa < 2eV Separation of alloy components may occur
Arc vaporizing Vaporizing of the target
plate in an electrical arc
10-1 Pa-1Pa 80eV-300eV Very good adhesion due to ion bombardement
Sputtering Atomizing of the target plate
(cathode) in a gas discharge
10-1 Pa-1Pa 10eV-100eV Sputtering of non-conductive materials possible through RF operation
Ion implantation Combination of vapor
deposition and sputtering
10-1 Pa-1Pa 80eV-300eV Very good adhesion from ion bombardment but also heating of the substrate material


The sputtering process has gained the economically most significant usage. Its process principle is illustrated in (Figure 1).

Figure 1: Principle of sputtering Ar = Argon atoms; e = Electrons; M = Metal atoms

Initially, a gas discharge is ignited in a low pressure (10-1 -1 Pa) argon atmosphere. The argon ions generated, are accelerated in an electric field and impact the target of material to be deposited with high energy. Caused by this energy, atoms are released from the target material which condensate on the oppositely arranged anode (the substrate) and form a layer with high adhesion strength. Through an overlapping magnetic field at the target location, the deposition rate can be increased, making the process more economical.

The advantages of the PVD processes and especially sputtering for electrical contact applications are:

  • High purity of the deposit layers
  • Low thermal impact on the substrate
  • Almost unlimited coating materials
  • Low coating thickness tolerance
  • Excellent adhesion (also by using additional intermediate layers)

Coatings produced by PVD processes are used for contact applications, for example on miniature-profiles, in electrical engineering and for electronic components, for solderability in joining processes, for metalizing of nonconductive materials, as well as in semiconductors, opto-electronics, optics and medical technology applications.

There are few limitations regarding the geometrical shape of substrate parts. Only the interior coating of drilled holes and small diameter tubing can be more problematic (ratio of depth to diameter should be < 2:1). Profile wires, strips and foils can be coated from one side or both; formed parts can be coated selectively by using masking fixtures that at the same time serve as holding fixtures (Figure 2).

Figure 2: Examples of vacuum coated semi finished materials and parts


  • Materials

Selection of possible combinations of coating and substrate materials

Substrate Materials

Coating Materials

Ag

Au

Pt

Pd

Cu

Ni

Ti

Cr

Mo

W

Ai

Si

Precious metal / alloys

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NF metals / alloys

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Fe alloys / stainless steel

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Special metals (Ti, Mo, W)

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Carbide steels (WC-Co)

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Ceramics (Al2O3, AlN)

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Glasses (SiO2, CaF)

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Plastics (PA, PPS)

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  • Dimensions
Dimensions
Coating thickness: 10 nm - 15 μm
Coating thicknesses for contact applications: 0.1 - 10 μm

For the geometry of semi-finished products to be coated, there are few restrictions. Only the coating of the inside of machined holes and tubing has limitations.

  • Tolerances

Coating thickness ±10 - 30 %, depending on the thickness

  • Quality criteria

Depending on the application, the following parameters are tested and recorded (see also: Electroplating of parts):

  • Coating thickness
  • Solderability
  • Adhesion strength
  • Bonding property
  • Porosity
  • Contact resistance

These quality tests are performed according to industry standards, internal standards and customer specifications resp.

Comparison of Deposition Processes

The individual deposition processes have in part different performance characteristics. For each end application, the optimal process has to be chosen, considering all technical and economical factors. The main selection criteria should be based on the electrical and mechanical requirements for the contact layer and on the design characteristics of the contact component. Table 3 gives some indications for a comparative evaluation of the different coating processes.

The electroless metal coating is not covered here because of the low thickness of deposits, which makes them in most cases not suitable for contact applications.


Table 3: Comparison of different coating processes
Process / Coating Properties Mechanical Processes (Cladding) Electroplating Vaccum Deposition (Sputtering)
Coating material formabe metal and alloys metals, alloys only limited metals and alloys
Coating thickness > 1μm 0.1 - approx. 10 μm
(in special cases up to 100 μm)
0.1 approx. 10 μm
Coating configuration selectively, stamping edges not coated all around and selectively
stamping edges coated
mostly selectivity
Adhesion good good very good
Ductility good limited good
Purity good inclusions of foreign materials very good
Porosity good good for > approx. 1μm good
Temperature stability goodvery good good very good
Mechanical wear little very little little
Environmental impact little significant none

The main differences between the coating processes are found in the coating materials and thickness. While mechanical cladding and sputtering allow the use of almost any alloy material, electroplating processes are limited to metals and selected alloys, such as for example high-carat gold alloys with up to .3 wt% Co or Ni. Electroplated and sputtered surface layers have a technological and economical upper thickness limit of about 10μm. While mechanical cladding has a minimum thickness of approx. 1 μm, electroplating and sputtering can also be easily applied in very thin layers down to the range of 0.1 μm.

The properties of the coatings are closely related to the coating process. Starting materials for cladding and sputtering targets precious metals and their alloys, which in the case of gold and palladium based materials, are vacuum melted and therefore exhibit a very high purity. During electroplating, depending on the type of electrolytes and the deposition parameters, some electrolyte components such as carbon and organic compounds are incorporated into the precious metal coating. Layers deposited from the gaseous phase however are very pure.

Hot (-Dipped) Tin Coated Strip Materials

During hot-dip tinning, pre-treated strip materials are coated with pure tin or tin alloys from a liquid solder metal. During overall (or all-around) tinning the strips through a liquid metal melt. For strip tinning, rotating rolls are partially immersed into a liquid tin melt and transport the liquid onto the strip, which is guided above them. Through special wiping and gas blowing procedures, the deposited tin layer can be held within tight tolerances. Hot tinning is performed directly onto the base substrate material without any pre-coating with either copper or nickel. Special cast-on processes or the melting of solder foils onto the carrier strip, also allows the production of thicker solder layers ( > 15 μm).

The main advantage of hot tinning of copper and copper alloys, compared to tin electroplating, is the formation of an inter-metallic copper-tin phase (Cu3Sn, Cu6Sn5) at the boundary between the carrier material and the tin layer. This thin (0.3 – 0.5 μm) intermediate layer, which is formed during the thermal tinning process, is rather hard and reduces the frictional force and mechanical wear in connectors. Tin coatings produced by hot tinning have a good adhesion to the substrate material and do not tend to tin whisker formation.

A special process of hot tinning is the “Reflow” process. After depositing a tin coating by electroplating, the layer is short-time melted in a continuous process. The properties of these reflow tin coatings are comparable to those created by conventional hot tinning.

Besides overall tin coating of strip material, the hot tinning can also be applied in the form of single or multiple stripes on both sides of a continuous substrate strip (Figure 3).

Figure 3: Typical examples of hot tinned strip materials


  • Materials

Coating materials: Pure tin, tin alloys
Substrate materials: Cu, CuZn, CuNiZn, CuSn, CuBe and others

  • Dimensions and Tolerances
Width of tinning: ≥ 3 ± 1 mm
Thickness of tinning: 1 - 15 μm
Tolerances (thickness): ± 1 - ± 3 μm depending on tin thickness
  • Quality Criteria

Mechanical strength and dimensional tolerances of hot tinned strips are closely related to the standard for Cu and Cu alloy strips according to DIN EN 1652 and DIN EN 1654. Quality criteria for the actual tin coatings are usually agreed upon separately.

Contact Lubricants

By using suitable lubricants, the mechanical wear and frictional oxidation of sliding and connector contacts can be substantially reduced. In the electrical contact technology, solid as well as high and low viscosity liquid lubricants are used.

Contact lubricants have to fulfill a multitude of technical requirements:

  • They must wet the contact surface well; after the sliding operation the lubrication film must close itself again, i.e. mechanical interruptions to heal
  • They should not transform into resins, not evaporate, and not act as dust collectors
  • The lubricants should not dissolve plastics, they should not be corrosive to non-precious metals or initiate cracking through stress corrosion of plastic components
  • The specific electrical resistance of the lubricants cannot be so low that wetted plastic surfaces lose their isolating properties
  • The lubricant layer should not increase the contact resistance; the wear reducing properties of the lubricant film should keep the contact resistance low and consistent over the longest possible operation time

Solid lubricants include for example 0.05 – 0.2 μm thin hard gold layers, which are added as surface layers on top of the actual contact material.

Among the various contact lubricants offered on the market, contact lubrication oils have shown performance advantages. They are mostly synthetic, chemically inert and silicone-free oils which differ in their chemical composition and viscosity.

For sliding contact systems with contact forces < 50 cN and higher sliding speeds, oils with a lower viscosity (< 50 mPa·s) are preferential. For applications with higher contact forces and operating at higher temperatures, contact oils with a higher viscosity are advantageous. Contact oils are mainly suited for applications at low current loads. At higher loads and in situations where contact separation occurs during the sliding operation, thermal decomposition may be initiated, which causes the lubricating properties to be lost.


Passivation of Silver Surfaces

The formation of silver sulfide during the shelf life of components with silver surface in sulfur containing environments, can be significantly eliminated by coating them with an additional protective film layer (Passivation layer). For electrical contact use, such thin layers should be chemically inert and sufficiently conductive, otherwise they are easily broken by the applied contact force.

Figure 4: Typical process flow for the SILVERBRITE W ATPS process

The passivation process SILVERBRITE W ATPS is a water-based tarnish preventer for silver (Figure 4). It is free of chromium(VI) compounds and solvents. The passivating layer is applied by immersion, which creates a transparent organic protective film which barely changes the appearance and only slightly increases the good electrical properties such as for example the contact resistance. The good solderability and bond properties of silver are not negatively affected. Because of its chemical composition, this protective layer has some lubricating properties which reduce the insertion and withdrawal forces of connectors noticeably.

References

Vinaricky, E. (Hrsg.): Elektrische Kontakte, Werkstoffe und Anwendungen. Springer-Verlag, Heidelberg 2002

Ganz, J.; Heber, J.; Macht, W.; Marka, E.: Galvanisch erzeugte Edelmetallschichten für elektrische Kontakte. Metall 61 (2007) H.6, 394-398

Song, J.: Edelmetalle in Steckverbindungen - Funktionen und Einsparpotential. VDE - Fachbericht 67 (2011) 13-22

Heber, J.: Galvanisch abgeschiedene Rhodiumschichten für den dekorativen Bereich. Galvanotechnik, 98 (2007) H.12, 2931-2935

Johler, W.; Pöffel, K.; Weik, G.; Westphal, W.: High Temperature Resistance th Galvanically Deposited Gold Layers for Switching Contacts. Proc. 15 Holm Conf. on Electrical Contacts, Chicago (2005) 48-54

Grossmann, H. Schaudt, G.: Untersuchung über die Verwendbarkeit von Überzügen der Platinmetallgruppe auf elektrotechnischen Verbindungselementen. Galvanotechnik 67 (1976) 292-297

Grossmann, H.; Vinaricky, E.: Edelmetalleinsparung in der Elektrotechnik durch selektives Galvanisieren. In: Handbuch der Galvanotechnik. München, Hanser- Verlag, 37 (1981) 132-141

Grossmann, H.; Schaudt, G.: Hochgeschwindigkeitsabscheidung von Edelmetallen auf Kontaktwerkstoffen. Galvanotechnik 84 (1993) H.5, 1541-1547

Bocking, C.; Cameron, B.: The Use of High Speed Selective Jet Electrodeposition of Gold for the Plating of Connectors. Trans. IMF. 72 (1994) 33-40

Endres, B.: Selektive Beschichtungen von Kontaktmaterial im Durchzugsverfahren. Metalloberfläche 39 (1985) H.11, 400-404

Kaspar, F.; Marka, E.; Normann, N.: Eigenschaften von chemisch Nickel Goldschichten für Baugruppen der Elektrotechnik. VDE Fachbericht 47 (1995) 19-27

Schmitt; W.; Kißling, S.; Behrens, V.: Elektrochemisch hergestellte Schichtsysteme auf Aluminium für Kontaktanwendungen. VDE - Fachbericht 67 (2011) 136-141

Freller, H.: Moderne PVD-Technologien zum Aufbringen dünner Kontaktschichten. VDE-Fachbericht 40 (1989) 33-39

Ganz, J.: PVD-Verfahren als Ergänzung der Galvanik. Metalloberfläche 45 (1991)

Schmitt, W.; Franz, S.; Heber, J.; Lutz, O.; Behrens, V.: Formation of Silver Sulfide Layers and their Influence on the Electrical Characteristics of Contacts in th the Field of Information Technology. Proc. 24 Int. Conf.on Electr. Contacts, Saint Malo, France (2008) 489-494

Buresch, I; Ganz, J.; Kaspar, F.: PVD-Beschichtungen und ihre Anwendungen für Steckverbinder. VDE-Fachbericht 59 (2003) 73-80

Gehlert, B.: Edelmetalllegierungen für elektrische Kontakte. Metall 61 (2007) H.6, 374-379

Ganz, J.: Einsatz von Sputterverfahren bei komplexen Beschichtungsaufgaben. JOT 11 (1997)

Buresch, I.; Bögel, A.; Dürrschnabel, W.: Tin Coating for Electrical Components. Metall 48 (1994) H.1, 11-14

Buresch, I.; Horn, J.: Bleifreie Zinnoberflächen. VDE-Fachbericht 61 (2005) 89-94

Adler, U.; Buresch, I.; Riepe, U.; Tietz, V.: Charakteristische Eigenschaften der schmelzflüssigen Verzinnung von Kupferwerkstoffen. VDE-Fachbericht 63 (2007) 175-180

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