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Surface Coating Technologies

21 bytes added, 14:29, 10 April 2014
7.2 Coatings from the Gaseous Phase (Vacuum Deposition)
The sputtering process has gained the economically most significant usage. Its process principle is illustrated in <xr id="fig:Principle of sputtering"/> (Fig. 7.5).
Fig. 7.5: Principle of sputtering Ar = Argon atoms; e = Electrons; M = Metal atoms<figure id="fig:Principle of sputtering">[[File:Principle of sputtering.jpg|right|thumb|Electroless Deposition Principle of Nickel/Goldsputtering Ar = Argon atoms; e = Electrons; M = Metal atoms]]
</figure>
Initially a gas discharge is ignited in a low pressure (10 – 1 Pa) argon atmosphere. The argon ions generated are accelerated in an electric field and