2,808
edits
Changes
→7.2 Coatings from the Gaseous Phase (Vacuum Deposition)
|80eV-300eV
|Very good adhesion due to ion bombardement
|-
|Sputtering
|Atomizing of the target plate<br />(cathode) in a gas discharge
|10<sup>-1</sup> Pa-1Pa
|10eV-100eV
|Sputtering of non-conductive materials possible through RF operation
|-
|Ion implantation
|Combination of vapor <br />deposition and sputtering
|10<sup>-1</sup> Pa-1Pa
|80eV-300eV
|Very good adhesion from ion bombardment but also heating of the substrate material
|}
</figtable>