2,808
edits
Changes
→7.2 Coatings from the Gaseous Phase (Vacuum Deposition)
In all four processes the coating material is transported in its atomic form to the substrate and deposited on it as a thin layer (a few nm to approx. 10 μm)
<figtable id="tab:Characteristics of the Most Important PVD Processes">
'''Table 7.6: Characteristics of the Most Important PVD Processes'''
{| class="twocolortable" style="text-align: left; font-size: 12px"
*'''Tolerances'''
Coating thickness +±10 - 30 %, depending on the thickness
*'''Quality criteria'''
