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Surface Coating Technologies

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Besides manufacturing contact materials from the solid phase, i.e. by melt orpowder metallurgy, the production starting in the liquid or gaseous phase isgenerally preferred when thin layers in within the μm range are required , which cannotbe obtained economically by conventional cladding methods(<xr id="tab:Overview_of_Important_Properties_of_Electroplated_Coatings_and_their_Applications"/><!--(Tab. 7.1)-->). Such coatingsfulfill different requirements depending on their composition and thickness.They can serve as corrosion or wear protection or can fulfill the need for thincontact layers for certain technical applications. In addition they serve fordecorative purposes as a pleasing and wear resistant surface coating.
<figtable id="tab:Overview_of_Important_Properties_of_Electroplated_Coatings_and_their_Applications"><caption>'''<!--Table 7.1: -->Overview of Important Properties of Electroplated Coatings and their Applications'''</caption>
<figtable id="tab:Overview of Important Properties of Electroplated Coatings and their Applications">
{| class="twocolortable" style="text-align: left; font-size: 12px"
|-
!Material Properties!Hardness ConditionApplications!Tensile Strength Rm [MPa] min.!Elongation A<sub>10</sub> [%] min.!Vickers Hardness HVExamples
|-
|AuColor|R 140<br />R 170<br />R 200<br />R 240Pleasing appearance|140<br />170<br />200<br />240|30<br />3<br />2<br />1|20<br />50<br />60<br />70|- |AuAg20|R 190<br />R 250<br />R 320<br />R 390|190<br />250<br />320<br />390|25<br />2<br />1<br />1|38<br />70<br />95<br />115Brass plated lamps and furniture hardware
|-
|AuAg30Luster|R 220<br />R 260<br />R 320<br />R 380Decorative appearance, Light reflection|220<br />260<br />320<br />380|25<br />3<br />1<br />1|45<br />75<br />95<br />110Chrome plated fixtures, silver coated mirrors
|-
|AuAg25Cu5|R 400<br />R 470<br />R 570<br Hardness />R 700Wear Resistance|400<br />470<br />570<br />700Prolonging of mechanical wear life|25<br />4<br />2<br />2|90<br />120<br />160<br />185Hard chrome plated tools
|-
|AuAg20Cu10Sliding properties|R 480<br />R 560<br />R 720<br />R 820Improvement of dry sliding wear|480<br />560<br />720<br />820|20<br />3<br />1<br />1|125<br />145<br />190<br />230Lead-tin-copper alloys for slide bearings
|-
|AuAg26Ni3Chemical stability|R 350Protection against chemical effects|Lead-Tin coatings as etch resist on PC boards|-|Corrosion resistance|Protection against environmental corrosion|Zinc coatings on steel parts|-|Electrical conductivity|Surface conduction of electrical current|Conductive path on PC boards|-|Thermal conductivity|Improved heat conduction on the surface|Copper plated bottoms for cookware|-|Machining capability|Shaping through machining|Copper coatings on low pressure cylinders|-|Magnetic properties|Increase of coercive force [[#text-reference|<br /sup>R 420*)<br /sup>R 500<br />R 570]] |Cobalt-nickel layers on magnetic storage media|-|Brazing and soldering|Brazing without aggressive fluxes|Tin-Lead coatings on PC board paths|-|Adhesion strength|Improvement of adhesion|Brass coating on reinforcement steel wires in tires|-|350<br />420<br />500<br />570Lubricating properties|20<br />2<br />1<br />1Improvement of formability|85<br />110<br />135<br />155Copper plating for wire drawing
|}
</figtable>
<div id="text-reference">*) Coercive force= force to retaim the adopted magnetisation</div>
To reduce the mechanical wear of thin surface layers on sliding and connectorcontacts , additional lubricants in liquid form are often used. On silver contacts, passivation coatings are applied as protection against silver sulfide formation.
==Coatings from the Liquid Phase==
For thin coatings starting from the liquid phase , two processes are useddifferentiated by the metallic deposition being performed either with or withoutthe use of an external electrical current source. The first one is electroplating, while the second one is a chemical deposition process.
=== Electroplating (or Galvanic Deposition)===
For electroplating of metals, especially precious metals, water based solutions(electrolytes) are used , which contain the metals to be deposited as ions (i.e.dissolved metal salts). An electric field between the anode and the work piecesas the cathode , forces the positively charged metal ions to move to the cathodewhere they give up their charge and deposit themselves as metal on the surfaceof the work piece.Depending on the application, for electric and electronic or decorative end use,different electrolytic bath solutions (electrolytes) are used. The electroplatingequipment used for precious metal plating and its complexity varies widely, depending on the process technologies employed.Electroplating processes are encompassing , besides the pure metal deposition, also preparative and post treatments of the goods to be coated. An importantparameter for creating strongly adhering deposits is that the surface of the goods has tobe metallic clean without oily or oxide film residues. This is achieved throughvarious pre-treatment processes , specifically developed for the types of materialand surface conditions of the goods to be plated.In the following segments , electrolytes – both precious and non-precious – aswell as the most widely used electroplating processes are described. 
Main Articel: [[Electroplating (or Galvanic Deposition)| Electroplating (or Galvanic Deposition)]]
===<!--7.1.2 -->Electroless Plating=== 
Electroless plating is defined as a coating process which is performed withoutthe use of an external current source. It allows a uniform metal coating, independent of the geometrical shape of the parts , to be coated. Because of thevery good dispersion capability of the used electrolytes , also cavities and theinside of drilled holes in parts can be coated for example.In principal , two different mechanisms are employed for electroless plating:processes in which the carrier material serves as a reduction agent (Immersionprocesses) and those in which a reduction agent is added to the electrolyte(Electroless processes).
Main Articel: [[Electroless Plating| Electroless Plating]]
==<!--7.2 -->Coatings from the Gaseous Phase (Vacuum Deposition)==The term PVD (physical vapor deposition) defines processes of metal, metalalloys, and chemical compounds deposition in a vacuum by adding thermal andkinetic energy through by particle bombardment. The main processes are thefollowing four coating variations ''(<xr id="tab:Characteristics of the Most Important PVD Processes"/><!--(Table 7.6-->)'':
*Vapor deposition *Sputtering (Cathode atomization)*Arc vaporizing *Ion implantation
In all four processes , the coating material is transported in its atomic form to thesubstrate and deposited on it as a thin layer (a few nm to approx. 10 μm)
Table 7.6: Characteristics of the Most Important PVD Processes
tabelle fehlt<figtable id="tab:Characteristics of the Most Important PVD Processes"><caption>'''<!--Table 7.6:-->Characteristics of the Most Important PVD Processes'''</caption>
The sputtering process has gained {| class="twocolortable" style="text-align: left; font-size: 12px"|-!Process!Principle!Process Gas Pressure!Particle Energy!Remarks|-|Vapor deposition|Vaporizing in a crucible <br />(electron beam or resistance heating)|10<sup>-3</sup> Pa|< 2eV|Separation of alloy components may occur|-|Arc vaporizing|Vaporizing of the economically most significant usage. Itstarget <br />plate in an electrical arcprocess principle is illustrated in ''|10<sup>-1</sup> Pa-1Pa|80eV-300eV|Very good adhesion due to ion bombardement|-|Sputtering|Atomizing of the target plate<br />(Fig. 7.5cathode)''.in a gas discharge|10<sup>-1</sup> Pa-1Pa|10eV-100eV|Sputtering of non-conductive materials possible through RF operation|-|Ion implantation|Combination of vapor <br />deposition and sputtering|10<sup>-1</sup> Pa-1Pa|80eV-300eV|Very good adhesion from ion bombardment but also heating of the substrate material|}</figtable>
Fig. 7.5: Principle of sputtering Ar = Argon atoms; e = Electrons; M = Metal atoms
Initially a gas discharge The sputtering process has gained the economically most significant usage. Its process principle is ignited illustrated in a low pressure (10 – 1 Pa) argonatmosphere<xr id="fig:Principle of sputtering"/><!--(Fig. The argon ions generated are accelerated in an electric field andimpact the target of material to be deposited with high energy7. Caused by thisenergy atoms are released from the target material which condensate on theoppositely arranged anode (the substrate5)-->) and form a layer with high adhesionstrength. Through an overlapping magnetic field at the target location thedeposition rate can be increased, making the process more economical.
<figure id="fig:Principle of sputtering">[[File:Principle of sputtering.jpg|right|thumb|Figure 1: Principle of sputtering Ar = Argon atoms; e = Electrons; M = Metal atoms]]</figure>Initially, a gas discharge is ignited in a low pressure (10<sup>-1</sup> -1 Pa) argon atmosphere. The advantages argon ions generated, are accelerated in an electric field and impact the target of material to be deposited with high energy. Caused by this energy, atoms are released from the target material which condensate on the PVD processes oppositely arranged anode (the substrate) and especially sputtering for electricalcontact applications are:form a layer with high adhesion strength. Through an overlapping magnetic field at the target location, the deposition rate can be increased, making the process more economical.
*High purity The advantages of the deposit layers *Low thermal impact on the *Almost unlimited coating materials substrate*Low coating thickness tolerance *Excellent adhesion (also by using additional intermediate layers)PVD processes and especially sputtering for electrical contact applications are:
Coatings produced by PVD processes are used for contact applications, for*High purity of the deposit layers example *Low thermal impact on miniature-profiles, in electrical engineering and for electronicthe substrate components, for solderability in joining processes, for metalizing of nonconductive*Almost unlimited coating materials materials, as well as in semiconductors, opto-electronics, optics,*Low coating thickness tolerance and medical technology applications.*Excellent adhesion (also by using additional intermediate layers)
There Coatings produced by PVD processes are few limitations regarding the geometrical shape of substrate parts.Only the interior coating of drilled holes used for contact applications, for example on miniature-profiles, in electrical engineering and small diameter tubing can be moreproblematic (ratio for electronic components, for solderability in joining processes, for metalizing of depth to diameter should be < 2:1). Profile wiresnonconductive materials, as well as in semiconductors, stripsopto-electronics,optics and foils can be coated from one side or both; formed parts can be coatedselectively by using masking fixtures that at the same time serve as holdingfixturesmedical technology applications.
*'''There are few limitations regarding the geometrical shape of substrate parts. Only the interior coating of drilled holes and small diameter tubing can be more problematic (ratio of depth to diameter should be < 2:1). Profile wires, strips and foils can be coated from one side or both; formed parts can be coated selectively by using masking fixtures that at the same time serve as holding fixtures (<xr id="fig:Examples of vacuum coated semi-finished materials and parts'''bild"/>).
<figure id="fig:Examples of vacuum coated semi finished materials and parts">
[[File:Examples of vacuum coated semi finished materials and parts.jpg|left|Figure 2: Examples of vacuum coated semi finished materials and parts]]
</figure>
 
<br style="clear:both;"/>
*'''Materials'''
Selection of possible combinations of coating and substrate materials
<table border="1" cellspacing="0" styleclass="border-collapse:collapsetwocolortable"><tr><tdth rowspan="2"><p class="s8">Substrate Materials</p></tdth><tdth colspan="12"><p class="s8">Coating Materials</p></tdth></tr><tr><tdth><p class="s8">Substrate Materials<span>Ag</span></p></tdth><tdth><p><span>AgAu</span></p></tdth><td><p><span>Au</span></p></td><tdth><p><span>Pt</span></p></tdth><tdth><p><span>Pd</span></p></tdth><tdth><p><span>Cu</span></p></tdth><tdth><p><span>Ni</span></p></tdth><tdth><p><span>Ti</span></p></tdth><tdth><p><span>Cr</span></p></tdth><tdth><p><span>Mo</span></p></tdth><tdth><p><span>W</span></p></tdth><tdth><p><span>Ai</span></p></tdth><tdth><p><span>Si</span></p></tdth></tr><tr><td><p class="s8">Precious metal / alloys</p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">NF metals / alloys</p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">Fe alloys / stainless steel</p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">Special metals (Ti, Mo, W)</p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">Carbide steels (WC-Co)</p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">Ceramics (Al<span class="s16">2</span>O<span class="s16">3</span>, AlN)</p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">Glasses (SiO<span class="s16">2</span>, CaF)</p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-leer.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr><tr><td><p class="s8">Plastics (PA, PPS)</p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td><td><p><span>[[File:K7-gef.png]]</span></p></td></tr></table> [[File:K7-gef.png]] can be produced[[File:K7-leer.png]] can be produced with intermediate layer
*'''Dimensions'''
{| class="twocolortable" style="text-align: left; font-size: 12px;width:40%"|-!colspan="2" style="text-align:center"|'''Dimensions'''|-|Coating thickness: |10 nm - 15 μm|-|Coating thicknesses for contact applications: |0.1 - 10 μm|}
For the geometry of semi-finished products to be coated , there are fewrestrictions. Only the coating of the inside of machined holes and tubing has
limitations.
*'''Tolerances'''
Coating thickness +&#177;10 - 30 %, depending on the thickness
*'''Quality criteria'''
Depending on the application , the following parameters are tested and recorded(see also: Electroplating of parts):
*Coating thickness *Solderability *Adhesion strength *Bonding property*Porosity *Contact resistance
These quality tests are performed according to industry standards, internalstandards, and customer specifications resp.
==<!--7.3 -->Comparison of Deposition Processes==The individual deposition processes have in part different performancecharacteristics. For each end application , the optimal process has to be chosen, considering all technical and economical factors. The main selection criteriashould be based on the electrical and mechanical requirements for the contactlayer and on the design characteristics of the contact component. <xr id="tab:Comparison of different coating processes"/><!--Table 7.7--> gives some indications for a comparative evaluation of the different coatingprocesses.
The electroless metal coating is not covered here because of the low thicknessof deposits , which makes them in most cases not suitable for contact
applications.
Table 7.7: Comparison of different coating processes
The main differences between the <figtable id="tab:Comparison of different coating processes are found in the coating">materials and thickness<caption>'''<!--Table 7. While mechanical cladding and sputtering allow theuse 7:-->Comparison of almost any alloy material, electroplating different coating processes are limited to metalsand selected alloys such as for example high-carat gold alloys with up to .3wt% Co or Ni. Electroplated and sputtered surface layers have a technologicaland economical upper thickness limit of about 10μm. While mechanical claddinghas a minimum thickness of approx. 1 μm, electroplating and sputteringcan also be easily applied in very thin layers down to the range of 0.1 μm.'''</caption>
The properties of the coatings are closely related to the coating process.{| class="twocolortable" style="text-align: left; font-size: 12px"|-!Process / Coating Properties!Mechanical Processes (Cladding)!Electroplating!Vaccum Deposition (Sputtering)|-|Coating materialStarting materials for cladding |formabe metal and sputtering targets precious alloys|metals, alloys only limited|metals and theiralloysalloys which |-|Coating thickness|> 1μm|0.1 - approx. 10 μm <br />(in the case special cases up to 100 μm)|0.1 approx. 10 μm|-|Coating configuration|selectively, stamping edges not coated|all around and selectively<br />stamping edges coated|mostly selectivity|-|Adhesion|good|good|very good|-|Ductility|good|limited|good|-|Purity|good|inclusions of gold and palladium based foreign materials are vacuummelted and therefore exhibit a |very high puritygood|-|Porosity|good|good for > approx. During electroplating, depending1μm|good|-|Temperature stability|goodvery good|good|very goodon the type of electrolytes and the deposition parameters, some electrolyte|-components such as carbon and organic compounds are incorporated into|Mechanical wearthe precious metal coating. Layers deposited from the gaseous phase however|littleare |very pure.little|little|-|Environmental impact|little|significant|none|}</figtable>
==7.4 Hot (-Dipped) Tin Coated Strip Materials==During hot-dip tinning pre-treated strip materials The main differences between the coating processes are coated with pure tin or tinalloys from a liquid solder metal. During overall (or all-around) tinning found in thestripsthrough a liquid metal melt. For strip tinning rotating rolls are partiallyimmersed into a liquid tin melt coating materials and transport the liquid onto the strip which isguided above themthickness. Through special wiping While mechanical cladding and gas blowing procedures sputtering allow thedeposited tin layer can be held within tight tolerances. Hot tinning is performeddirectly onto the base substrate use of almost any alloy material without any pre, electroplating processes are limited to metals and selected alloys, such as for example high-coating carat gold alloys with eithercopper up to .3 wt% Co or nickelNi. Special cast-on processes or the melting Electroplated and sputtered surface layers have a technological and economical upper thickness limit of about 10μm. While mechanical cladding has a minimum thickness of solder foils ontothe carrier strip allow approx. 1 μm, electroplating and sputtering can also be easily applied in very thin layers down to the production range of thicker solder layers(> 15 0.1 μm).
The main advantage properties of hot tinning of copper the coatings are closely related to the coating process. Starting materials for cladding and sputtering targets precious metals and copper their alloys as compared totin electroplating is , which in the formation case of an inter-metallic copper-tin phase (Cu<sub>3</sub>Sngold and palladium based materials,Cu<sub>6</sub> Sn<sub>5</sub>) at the boundary between the carrier material are vacuum melted and the tin layertherefore exhibit a very high purity. This thin(0.3 – 0.5 μm) intermediate layerDuring electroplating, which is formed during depending on the type of electrolytes and the thermal tinningprocessdeposition parameters, is rather hard some electrolyte components such as carbon and reduces in connectors organic compounds are incorporated into the frictional force andmechanical wearprecious metal coating. Tin coatings produced by hot tinning have a good adhesion toLayers deposited from the substrate material and do not tend to tin whisker formationgaseous phase however are very pure.
A special process of ==<!--7.4-->Hot (-Dipped) Tin Coated Strip Materials==During hot -dip tinning, pre-treated strip materials are coated with pure tin or tin alloys from a liquid solder metal. During overall (or all-around) tinning is the “Reflow” processstrips through a liquid metal melt. After depositing For strip tinning, rotating rolls are partially immersed into a liquid tincoating by electroplating melt and transport the liquid onto the strip, which is guided above them. Through special wiping and gas blowing procedures, the deposited tin layer can be held within tight tolerances. Hot tinning is shortperformed directly onto the base substrate material without any pre-time melted in a continuous processcoating with either copper or nickel.The properties Special cast-on processes or the melting of solder foils onto the carrier strip, also allows the production of these reflow tin coatings are comparable to those created byconventional hot tinningthicker solder layers ( > 15 μm).
Besides overall The main advantage of hot tinning of copper and copper alloys, compared to tin coating electroplating, is the formation of strip an inter-metallic copper-tin phase (Cu<sub>3</sub>Sn, Cu<sub>6</sub>Sn<sub>5</sub>) at the boundary between the carrier material and the tin layer. This thin (0.3 – 0.5 μm) intermediate layer, which is formed during the thermal tinning process, is rather hard and reduces the frictional force and mechanical wear in connectors. Tin coatings produced by hot tinning can also be applied inhave a good adhesion to the form of single or multiple stripes on both sides of a continuous substratestripmaterial and do not tend to tin whisker formation.
*'''Typical examples A special process of hot tinned strip materials'''tinning is the “Reflow” process. After depositing a tin coating by electroplating, the layer is short-time melted in a continuous process.bildThe properties of these reflow tin coatings are comparable to those created by conventional hot tinning.
Besides overall tin coating of strip material, the hot tinning can also be applied in the form of single or multiple stripes on both sides of a continuous substrate strip (<xr id="fig:Typical examples of hot tinned strip materials"/>).
 
<figure id="fig:Typical examples of hot tinned strip materials">
[[File:Typical examples of hot tinned strip materials.jpg|left|Figure 3: Typical examples of hot tinned strip materials]]
<br style="clear:both;"/>
</figure>
<br style="clear:both;"/>
*'''Materials'''
Coating materials: Pure tin, tin alloys<br>Substrate materials: Cu, CuZn, CuNiZn, CuSn, CuBe and others<br />
*'''Dimensions and Tolerances'''
{| class="twocolortable" style="text-align: left; font-size: 12px;width:40%"|-|Width of tinning: > |&#8805; 3 + &#177; 1 mm|-|Thickness of tinning: |1 - 15 μm|-|Tolerances (thickness): + |&#177; 1 - +&#177; 3 μm depending on tin thickness|}
*'''Quality Criteria'''
Mechanical strength and dimensional tolerances of hot tinned strips are closelyrelated to the standard for Cu and Cu alloy strips according to DIN EN 1652 andDIN EN 1654.
Quality criteria for the actual tin coatings are usually agreed upon separately.
==<!--7.5 -->Contact Lubricants==By using suitable lubricants , the mechanical wear and frictional oxidation ofsliding and connector contacts can be substantially reduced. In the electricalcontact technology , solid, as well as high and low viscosity liquid lubricants areused.
Contact lubricants have to fulfill a multitude of technical requirements:
*The lubricant layer should not increase the contact resistance; the wear reducing properties of the lubricant film should keep the contact resistance low and consistent over the longest possible operation time
Solid lubricants include for example 0.05 – 0.2 μm thin hard gold layers , whichare added as surface layers on top of the actual contact material.
Among the various contact lubricants offered on the market , contact lubricationoils have shown performance advantages. They are mostly synthetic, chemically inert, and silicone-free oils such as for example the DODUCONTAcontact lubricants which differ in their chemical composition and viscosity.
For sliding contact systems with contact forces < 50 cN and higher slidingspeeds , oils with a lower viscosity (<50 mPa·s) are preferential. For applicationswith higher contact forces and operating at higher temperatures , contact oilswith a higher viscosity are advantageous. Contact oils are mainly suited forapplications at low current loads. At higher loads and in situations wherecontact separation occurs during the sliding operation , thermal decompositionmay be initiated , which causes the lubricating properties to be lost.
Most compatible with plastics are the contact oil varieties B5, B12K, and B25,
which also over longer operating times do not lead to tension stress corrosion.
For the optimum lubrication only a very thin layer of contact oil is required.Therefore it is for example recommended to dilute the oil in iso-propylenealcoholduring the application to contact parts. After evaporation of the alcohola thin and uniform layer of lubricant is retained on the contact surfaces.  *'''Properties of the Synthetic DODUCONTA Contact Lubricants''' <table border="1" cellspacing="0" style="border-collapse:collapse"><tr><td><p class="s8">Lubricant</p></td><td><p class="s8">DODUCONTA</p></td></tr><tr><td><p class="s8">Lubricant</p></td><td><p class="s8">B5</p></td><td><p class="s8">B9</p></td><td><p class="s8">B10</p></td><td><p class="s8">B12K</p></td><td><p class="s8">B25</p></td></tr><tr><td><p class="s8">Contact force</p></td><td><p class="s8">&gt;1N</p></td><td><p class="s8">0.1 !- 2N</p></td><td><p class="s8">&lt; 0.2N</p></td><td><p class="s8">0.2 - 5N</p></td><td><p class="s8">&lt;1N</p></td></tr><tr><td><p class="s8">Density (20°C)</p><p class="s8">[g/cm³]</p></td><td><p class="s8">1.9</p></td><td><p class="s8">1.0</p></td><td><p class="s8">0.92</p></td><td><p class="s8">17.0</p></td><td><p class="s8">1.0</p></td></tr><tr><td><p class="s8">Specificel. Resis-</p><p class="s8">tance [<span class="s9">S · </span>cm]</p></td><td/><td><p class="s8">2 x 10<span class="s18">10</span></p></td><td><p class="s8">10<span class="s18">10</span></p></td><td><p class="s8">6 x 10<span class="s18">9</span></p></td><td><p class="s8">5 x 10<span class="s18">8</span></p></td></tr><tr><td><p class="s8">Viscosity (20°C)</p><p class="s8">[mPa·s]</p></td><td><p class="s8">325</p></td><td><p class="s8">47</p></td><td><p class="s8">21</p></td><td><p class="s8">235</p></td><td><p class="s8">405</p></td></tr><tr><td><p class="s8">Congeal temp.[°C]</p></td><td/><td><p class="s8">-55</p></td><td><p class="s8">-60</p></td><td><p class="s8">-40</p></td><td><p class="s8">-35</p></td></tr><tr><td><p class="s8">Flash point[°C]</p></td><td/><td><p class="s8">247</p></td><td><p class="s8">220</p></td><td><p class="s8">238</p></td><td><p class="s8">230</p></td></tr><tr><td/><td><p class="s8">220</p></td><td/><td/></tr></table>  *'''Applications of the Synthetic DODUCONTA Contact Lubricants''' <table border="1" cellspacing="0" style="border-collapse:collapse"><tr><td><p class="s8">Lubricant</p></td><td><p class="s8">Applications</p></td></tr><tr><td><p class="s8">DODUCONTA B5</p></td><td><p class="s8">Current collectors, connectors, slider switches</p></td></tr><tr><td><p class="s8">DODUCONTA B9</p></td><td><p class="s8">Wire potentiometers, slip rings, slider switches, measuring range selectors, miniature connectors</p></td></tr><tr><td><p class="s8">DODUCONTA B10</p></td><td><p class="s8">Precision wire potentiometers, miniature slip rings</p></td></tr><tr><td><p class="s8">DODUCONTA B12K</p></td><td><p class="s8">Wire potentiometers, slider switches, miniature slip rings, connectors</p></td></tr><tr><td><p class="s8">DODUCONTA B25</p></td><td><p class="s8">Current collectors, measuring range selectors, connectors</p></td></tr></table> ==7.6 Passivation of Silver Surfaces==The formation of silver sulfide during the shelf life of components with silversurface in sulfur containing environments , can be significantly eliminated bycoating them with an additional protective film layer (Passivation layer). Forelectrical contact use , such thin layers should be chemically inert andsufficiently conductive, or be otherwise they are easily broken by the applied contact force.<figure id="fig:Typical process flow for the SILVERBRITE W ATPS process">[[File:Typical process flow for the SILVERBRITE W ATPS process.jpg|right|thumb|Figure 4: Typical process flow for the SILVERBRITE W ATPS process]]</figure>The passivation process SILVERBRITE W ATPS is a water-based tarnishpreventer for silver(<xr id="fig:Typical process flow for the SILVERBRITE W ATPS process"/>). It is free of chromium(VI) compounds and solvents. Thepassivating layer is applied by immersion , which creates a transparent organicprotective film which barely changes the appearance and only slightlyincreases the good electrical properties such as for example the contactresistance. The good solderability and bond properties of silver are notnegatively affected. Because of its chemical composition , this protective layerhas some lubricating properties which reduce the insertion and withdrawalforces of connectors noticeably. Fig. 7.7: Typical process flow for the SILVERBRITE W ATPS process
==References==
das Korrosions- und Kontaktverhalten von Ag – Beschichtungen in
schwefelhaltiger Umgebung. VDE – Fachbericht 65 (2009) 51 – 58
 
[[de:Beschichtungsverfahren]]